The Role of Specialty Chemicals in Chip Manufacturing

18 Aug.,2025

 

The Role of Specialty Chemicals in Chip Manufacturing

Electrically conductive structures on microchips are separated by ultrathin insulation layers that have a thickness of only a few nanometers. To prevent disruptive discharge and chip failure, the insulating layers must be hyperpure and possess an even thickness throughout.

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In chip production, insulation layers are created in a process which experts refer to as plasma-enhanced chemical vapor deposition (PECVD). This coating method uses plasma to heat the wafer in cleanroom conditions to a temperature between 500 °C and 1,200 °C Silane is then fed onto the heated wafer surface where it is deposited in a chemical reaction to yield a solid insulating layer.

To increase productivity, manufacturers are keen on the fastest possible deposition. With low heating time and under high temperatures, however, wafers are subject to stress. This can lead to a faulty crystalline structure of the silicon and subsequently to rejects. To make sure this doesn’t happen, microchip manufacturers require a silane that allows the fastest possible deposition at a moderately high temperature.

This is where WACKER’s specialty silanes play a crucial role. With tetraethoxysilane (TEOS), WACKER provides the right silane for producing a quartz glass-like layer of amorphous silica. This presents a good trade-off between the intended high deposition rates and the requirement to avoid rejects.

Today, WACKER’s specialty silanes are the go-to material for many manufacturers who appreciate the consistently high quality of our products.

The process of chemical vapor deposition causes solids to be deposited on the process chamber walls. Over a period of time, the solids deposited increase to such an extent that particles can easily fall off and land on the wafer surface. Consequently, chips manufactured from such wafers are useless.

To prevent this, regular cleaning of the process chamber is a must. To this effect, manufacturers resort to hydrogen chloride gas, which etches the deposits off the chamber walls. It goes without saying that the hydrogen chloride used should be hyperpure in order to prevent new impurities from being deposited on the chamber walls and then falling off to land on the wafers.

WACKER’s SEMICOSIL® HCl 5.5 is a hydrogen chloride with a purity level of 99.999 percent. “This means we even exceed the current purity requirements of microchip manufacturers and are thus in an ideal position to meet the challenges of an ever-changing market,” explains Business Development Manager Sigrid Rothenhäusler.

WACKER uses rock salt from its own mine to produce hydrogen chloride. The composition and purity of the salt mined there is especially suitable for the production of this hyperpure gas.

Before superimposing structures on a microchip, care should be taken to ensure that the wafer surface is absolutely flat and smooth before depositing silane onto the next layer. Chip manufacturers accomplish this by polishing smooth the topmost layer so as to eliminate any unevenness. This is achieved with a high level of precision by implementing a process known as chemical-mechanical polishing that combines mechanical abrasion with chemical etching.

Pyrogenic silica is simply perfect for chemical-mechanical polishing. Just like granules in a facial scrub, the flocculent powder removes any excess material. “Polishing slurries that contain our product are more abrasive than colloidal silica that is frequently used in the semiconductor industry. This is particularly advantageous for chip manufacturers who aim to achieve a high level of material abrasion,” explains Arne Meier.

In addition to its high degree of purity, the narrow size distribution of the abrasive particles is an outstanding property of pyrogenic silica made by WACKER. The entire manufacturing process is controlled to ensure that no large particles are formed. “You can be absolutely sure that there will be no scratches as a result of polishing,” highlights Meier.

Electronic Chemicals and Growth of The Electrotonic Industries

Electronic Chemicals and Growth of The Electrotonic Industries

Introduction and outcome

Electronic chemicals play an important role in the development of electronics. For example, these are the electronic chemicals which make laptops lighter and mobile screens clearer and bigger. In this article , you will learn about Electronic chemicals, their applications, manufacturers and frequently asked questions on electronic chemicals.

Electronic Chemicals

The Specialty chemicals, which are used in Electronic industries to enhance technological performance, cost efficiency of electronic components and devices, are called Electronic chemicals. Their high purity and specific chemical properties make them essential in producing semiconductor devices, printed circuit boards (PCBs), and other integral parts of electronic devices. These chemicals ensure the optimal performance of electronic products by enabling precise etching, cleaning, doping, and other vital processes.

Common Electronic Chemicals

  • Specialty gases
  • CMP slurries
  • Photoresists
  • Conductive polymers
  • Wet chemicals
  • Acids, bases and solvents and
  • Electronic materials like wafer, laminates etc

3 Key Applications of Electronic Chemicals

The Electronics chemicals are used The following are the applications of the Electronic chemicals:

  1. Semiconductor Manufacturing
  2. Printed Circuit Boards
  3. Display Panels

Semiconductor Manufacturing: Among the most critical applications, electronic chemicals facilitate the creation of wafer patterns, doping of semiconductors, and cleaning of silicon wafers.

Printed Circuit Boards: Electronic chemicals are crucial in the etching, plating, and developing processes required for creating PCBs, which are the backbone of most electronic systems.

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Display Panels: In the production of display panels like LCDs and OLEDs, electronic chemicals help in the cleaning and etching of the display substrates.

Semiconductor solvents

Semiconductor solvents are chemicals used in the semiconductor manufacturing process to clean, etch, or dissolve materials, as well as to remove residues during various stages of semiconductor device fabrication. These solvents must have specific characteristics, such as high purity, low volatility, and low toxicity, to meet the stringent requirements of the semiconductor industry.

The following are some commonly used semiconductor solvents and their typical applications:

  1. Acetone
  2. Isopropyl Alcohol (IPA)
  3. N-Methyl-2-Pyrrolidone (NMP)
  4. Hydrofluoric Acid (HF)
  5. Sulfuric Acid (H₂SO₄)
  6. Ammonium Hydroxide (NH₄OH)
  7. Tetrahydrofuran (THF)
  8. Dimethyl Sulfoxide (DMSO)
  9. Chlorinated Solvents (e.g., Trichloroethylene, Tetrachloroethylene)
  10. Ozone and UV-Ozone Treatment

Acetone

  • Uses: Acetone is commonly used for cleaning purposes in the semiconductor industry. It is effective at removing organic residues, oils, and particles from wafer surfaces before processes like photolithography or etching.
  • Properties: It is a highly volatile solvent, which evaporates quickly and leaves minimal residues.

Isopropyl Alcohol (IPA)

  • Uses: IPA is one of the most widely used solvents for cleaning semiconductor wafers. It is often used to rinse wafers after a cleaning step or to clean equipment. It helps to remove oils, dust, and organic contaminants.
  • Properties: It is a relatively safe, effective solvent that evaporates quickly without leaving significant residues. IPA is often used in combination with deionized water for rinsing.

N-Methyl-2-Pyrrolidone (NMP)

  • Uses: NMP is used in cleaning, stripping photoresist layers, and in some etching processes. It is also used to dissolve certain types of resins or polymers.
  • Properties: NMP is a strong polar solvent that can dissolve a wide range of materials, including oils, resins, and photoresists.

Hydrofluoric Acid (HF)

  • Uses: HF is primarily used for etching silicon dioxide (SiO₂) and cleaning silicon wafer surfaces. It is used to remove native oxide layers from silicon wafers or to etch oxide films.
  • Properties: HF is a very strong acid and requires careful handling due to its high toxicity and corrosiveness. It must be used in dilute concentrations to be safe.

Sulfuric Acid (H₂SO₄)

  • Uses: Sulfuric acid is often used in conjunction with hydrogen peroxide (H₂O₂) in cleaning solutions (called piranha solution) to remove organic contamination and residues from semiconductor surfaces.
  • Properties: It is highly corrosive and must be handled with extreme care. Piranha solution is used to clean wafers before processes like oxidation or deposition.

Ammonium Hydroxide (NH₄OH)

  • Uses: Ammonium hydroxide is often used to clean surfaces, particularly in removing organic and inorganic contaminants. It is sometimes used in combination with hydrogen peroxide to remove organic contamination.
  • Properties: It is a strong base and can dissolve certain organic materials, making it useful in cleaning applications.

Tetrahydrofuran (THF)

  • Uses: THF is used in the dissolution of certain photoresists and polymers during the semiconductor manufacturing process. It is also used as a solvent in cleaning and stripping applications.
  • Properties: It is a highly volatile, low-polarity solvent that is effective at dissolving various organic materials.

Dimethyl Sulfoxide (DMSO)

  • Uses: DMSO is used as a solvent in certain cleaning applications, especially for dissolving organic contaminants or photoresists.
  • Properties: It is a polar solvent that is known for its ability to dissolve a wide variety of organic compounds.

Chlorinated Solvents (e.g., Trichloroethylene, Tetrachloroethylene)

  • Uses: These solvents are sometimes used in cleaning steps during semiconductor processing, though their use has decreased due to environmental and health concerns.
  • Properties: Chlorinated solvents are highly effective at dissolving oils and other organic contaminants but can be toxic and are being phased out in favor of safer alternatives.

Ozone and UV-Ozone Treatment

  • Uses: Ozone is often used in semiconductor cleaning for removing organic contaminants, such as photoresists, and to improve the surface quality of wafers before deposition or etching.
  • Properties: Ozone is a strong oxidizing agent that can break down organic materials. UV-ozone treatment uses ultraviolet light to activate ozone, improving its cleaning efficiency.

Key Considerations When Using Semiconductor Solvents:

  • Purity: Contaminants in solvents can interfere with the precise processes used in semiconductor manufacturing. Solvents must be of high purity to prevent contamination.
  • Volatility: Many semiconductor solvents are highly volatile to ensure fast drying times, which is important for processes like lithography and etching.
  • Toxicity and Safety: Many solvents used in semiconductor processing can be toxic or hazardous. Safe handling, ventilation, and appropriate protective equipment are essential.
  • Environmental Impact: With increasing regulations on chemical usage, there has been a push to use more environmentally friendly solvents and reduce the use of harmful or ozone-depleting chemicals.

These solvents are critical in ensuring that semiconductor devices are manufactured with high precision and cleanliness, essential for the functioning of modern electronics.

Electronic Chemicals Companies

The market for electronic chemicals includes several key players known for their quality and innovation such as :

Dow Inc.: A major name in the specialty chemicals industry, Dow provides an extensive range of electronic chemicals used in semiconductor and advanced display manufacturing.

Sumitomo Chemical: This Japanese multinational is another significant player, producing high-purity chemicals and materials for electronics.

DuPont: With a long history in the chemical industry, DuPont supplies diverse electronic materials for semiconductors, ICs, and displays.

As the demand for advanced technology grows, the role of electronic chemicals becomes even more pivotal, driving innovation and progress in the electronics sector.

Conclusion

I hope this article has helped you understand Electronic Chemicals and its importance. You may also want to check out other articles on my blog, such as GLP and SOP.

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FAQs

What is the Electronic chemicals?

The Specialty chemicals, which are used in Electronic industries to enhance technological performance, cost efficiency of electronic components and devices, are called Electronic chemicals.

What chemicals are used in the semiconductor?

The typical chemicals which are used in the semiconductors are trichloroethylene, isopropyl alcohol(IPA), ethanol (ETOH) and acetone

What are the EC chemicals?

Emulsifiable concentrate formulations are called EC chemicals. EC is an oil based formulation which contains active ingredients dissolved in solvents and emulsifiers.

What harmful chemicals are in electronics?

Electronics contain several harmful chemicals like Beryllium, Cadmium (Cd), Chromium (Cr), Lead (Pb). Mercury (Hg), Polyvinyl chloride (PVC) and Brominated flame retardants (BFRs)

What chemical are used in the microchips?

Chemicals like Xylene, Ethylene glycol, ammonia, Arsenic, Nitrate compounds, Hydrogen fluoride and cadmium are used in microchips.

What is the main ingredient in the semiconductor?

Silicon or Germanium or compounds such Gallium arsenide

If you want to learn more, please visit our website TMAH Developer.

References
  • https://www.sarex.com/fine/chemicals-electronics-industry
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